We evaluated contact angles, surface properties and lithographic performances of the polymer blend resists. We blended the base polymer (Resin 0) with Resin (1-6), respectively. For a better understanding of the surface properties of thin films, we prepared the six resins (Resin 1-6) that have three types fluorine containing monomers, a new monomer (Monomer A), Monomer B and Monomer C, respectively. We have examined methacrylate-based resins that control the surface properties of ArF resists thin films by surface segregation behavior. Our recent research effort has been focused on new top coating-free 193nm immersion resists with regard to leaching of the resist components and lithographic performance. Takemoto, Ichiki Ando, Nobuo Edamatsu, Kunishige Fuji, Yusuke Kuwana, Koji Hashimoto, Kazuhiko Funase, Junji Yokoyama, Hiroyuki Tailoring surface properties of ArF resists thin films with functionally graded materials (FGM)
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